NIITM OJSC

⟦missing:ar:Main products and directions⟧

Plasma-Chemical Deposition Vacuum System with ICP Source - Izofaz TM 200-01, Plasma Chemical Etching Vacuum System with ICP Source and Cassette Loading TM 300, Plasma Chemical Deposition Vacuum System with ICP Source and Cassette Loader, Four-Position Vacuum Coating System with Magnetron Sputtering MAGNA TM 5, Compact Vacuum Coating System for Magnetron Sputtering, Model MVU Magna 12, Vacuum Coating System with Magnetron Sputtering and Cassette Loading MAGNA TM 29, Plasma Etching Vacuum System with ICP Plasma Source TM 9, Compact Plasma Cleaning Vacuum System for Photoresist Removal and Sterilization TM 4, Industrial-Oriented Technological Complex Cluster TM 200, Gallium Nitride Epitaxy System for Power Transistors TM 200-01, Deep Anisotropic Etching Vacuum System MVU TM PLASMA 06, Plasma Chemical Anisotropic Selective Etching System Plasma TM 200-01, Magnetron Sputtering Vacuum Coating System Magna TM 22, Magnetron Sputtering Vacuum Coating System MAGNA TM 7, Reactive Ion Etching Vacuum System with Load Lock PLASMA TM 7, Reactive Ion Etching Vacuum System with Cassette to Cassette Load, Plasma TM 8, Four-Position Vacuum Coating System with Magnetron Sputtering and Electron Beam Evaporation, Model: 4P-VAC-2023